Mini CVD tube furnace for preparing graphene

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Product Details

This CVD system is specially designed for graphene production, using a 1200℃ mini tube furnace, equipped with a high-precision mass flow meter and a thin-film vacuum gauge. Compared with the conventional Pirani resistance gauge, the reading of the thin film gauge is accurate and not affected by the type of gas, which is very suitable for the vacuum coating process. At the same time, the equipment is equipped with a combustible gas detection device, which is linked with a solenoid valve at the air outlet. Once there is a leakage, the solenoid valve can be closed to ensure safety.
This set of equipment has a small footprint and is very suitable for laboratory preparation of CVD.

Mini CVD tube furnace technical parameters:

1200℃ Mini Tube Furnace Parameters:
Supply voltage	AC220V, 50Hz
Maximum power	2KW
Heating zone	Single heating zone 200mm
Constant temperature zone length	100mm
Heating element	Heat-resistant alloy wire
Thermocouple	K type
Operating temperature	≤1150℃
Heating rate	Suggest ≤10℃/min
Temperature control accuracy	±1℃
Temperature control method	AI-PID 30-segment process curve, with overheat and burnout protection
Furnace tube material	High purity quartz
Furnace tube size	φ50mm O.D x 450mm L
Vacuum pump	Mechanical pump, pumping speed 1.1L/s
Vacuum pump	5Pa
Three-channel mass flow meter parameters:
Valve type	Stainless steel needle valve
Number of gas paths	Three
Pressure range	0.05~0.3MPa
Range	Ar 0~500sccm H2 0~200sccm CH4 0~10sccm
Flow control range	±1.5%
Mixing tank volume	750mL
Gas path material	304 stainless steel
Pipe interface	6.35mm ferrule connector
Power supply	AC220V 50Hz

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