Dual target upper sputtering DC RF magnetron sputtering coating machine

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Product Details

HS-MSP500S-DCRF-B is a special laboratory coating machine with two targets developed by our company. It is equipped with a DC power supply and a RF power supply. It can be used to prepare single or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.
Features of magnetron sputtering coater:
a. Compared with the conventional plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high deposition rate and low sample temperature rise;
b. The magnetron target is equipped with water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time;
c. This model adopts the layout of under target, the sample table is on the top, and the height with the target surface can be precisely adjusted by program, and can be rotated and heated, with excellent performance.
Technical parameters of magnetron sputtering coater:

Model	HS-MSP500S-DCRF-B
Input	AC220V，50Hz
Total power	6KW
Ultimate vacuum degree	5x10^-4Pa
Sample table parameters	Size	150 Dia.
	Height	70 mm adjustable
	Heating	≤500℃
	Rotation speed	1-20 rpm
Magnetron sputtering head parameters	Quantity	2-set，2-inch
	Cooling mode	Water cooled，required flow rate10L/min
	Water chiller	10L/min circulating water cooling
Vacuum chamber	Size	500mm Dia. × 490mm H
	Material	Stainless steel
	Watch window	100mm Dia.
	Open mode	front opening door
Gas flow controller	1channel 200sccm Ar
Vacuum pump	Molecular pump system pumping,600L/S
Film thickness gauge	Quartz vibrating film thickness gauge ， one set，Resolution 0.10 Å
Sputter power supply	DC power supply：one set，500W，for metal films RF power supply：one set，500W，for non-metallic films
Operating mode	All-in-one computer operation
Overall dimensions	1090mm x 900mm x 1250mm
Total weight	350kg

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