Desktop double head magnetron sputtering coating machine

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Product Details

This equipment is a double target magnetron sputter coating machine, which can be used in the preparation of metal films, in the fields of electronics, optics, special ceramics, etc. it can also be used to prepare SEM samples in laboratory.
It adopts high vacuum stainless steel chamber, front door opening design, and quartz observation window on the door, which is convenient for the observation and recording of the experiment. At the same time, the equipment is equipped with a rotary heating sample table, which can effectively improve the film uniformity and film quality. A set of baffle plate is installed on the top cover, and the two targets can be switched by rotating the baffle plate to realize multilayer coating.
This equipment needs to be used together with high vacuum molecular pump group. Users can choose imported brand small molecular pump to further save installation area.
At the same time, the model can be equipped with film thickness meter components, which can monitor the film thickness in real time and provide reliable parameters for the experimental process.
Technical parameters:

Sample stage	Size	100mm	Heating	≤500℃
Sample stage	Rotation speed	1-20r/min	Temp control	±1℃
Magnetron sputter head	Quantity	2” x2	Cooling mode	Water cooled
Vacuum chamber	Size	Dia 210mm× 260mm	Watch window	φ40mmc
Vacuum chamber	Material	SUS	Open mode	Front opening
Sputter power supply	DC power supply	1 set	Output power	≤300W
Sputter power supply	Output voltage	≤600V	response time	＜5ms
Water cooling	Tank capacity	9L	Flow	10 L/min
Film thickness gauge	Accuracy	0.1angstrom	Cooling mode	Water cooling
Other	Power supply	AC220V,50Hz	Total power	4kw
Molecular pump system	Backing pump	Rotary vane pump	Pumping	1.1L/s
	Secondary pump	turbo molecular pump (domestic)	Pumping	600L/s
	Extraction interface	KF40	Air outlet	KF16

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