Dual target magnetron sputtering and thermal evaporation composite coating machine

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Product Details

HS-MS500S-2TA1S magnetron sputter & thermal evaporation two-in-one coating machine can be used for the coating of electronic products, glass, ceramic samples, metal and other samples, especially suitable for sample preparation of laboratory SEM (scanning electron microscope).
The equipment is mainly composed of stainless steel vacuum chamber, magnetron sputtering target, evaporation source, rotary heating sample table, vacuum pump unit, vacuum measurement gauge, air intake system and control system.

Features of PVD coating equipment:
a. Touch screen operation, temperature control meter detection. Digital parameter interface and automatic operation mode provide users with an excellent research and development platform;
b. The vacuum chamber is made of 304 stainless steel with observation window and baffle. Beautiful shape, fine workmanship, excellent vacuum performance. The main sealing flange is CF series high vacuum sealing flange. Each interface of vacuum chamber is sealed with rubber seal ring, which has excellent vacuum performance and can effectively ensure the coating quality;
c. The target is located at the bottom of the cavity, and the target is upward. The sample table has the function of heating and rotating, which can make the coating effect more uniform;
d. The vacuum acquisition system adopts two-stage vacuum pump group. The backing pump is mechanical pump with high pumping speed, which can effectively reduce the time from atmospheric pressure to low vacuum. The main pump is turbine molecular pump, which has high pumping speed and faster vacuum acquisition speed. The overall vacuum acquisition system is clean and fast.

Technical parameters of PVD coating equipment:

Model				HS-MS500S-2TA1S
Sample table	Size	150mm Dia.	Heating	≤500℃
	Rotation speed	1-20r/min	Temp control	±1℃
Magnetron sputter head	Quantity	2-inch ×2	Cooling mode	Water cooled
Thermal evaporation	evaporator source	Tungsten wire basket	Max temp	1500℃
Thermal evaporation	Thermocouple	S type
Vacuum chamber	Size	300mmDia.× 300mmH	Watch window	100mm Dia
Vacuum chamber	Material	304 SUS	Open mode	Front opening door
Vacuum system	Mechanical pump	Rotary vane pump	Extraction interface	KF16
	Molecular pump	1.1L/s
	Molecular pump	Turbo molecular pump	Extraction interface	CF150
	Pumping	600L/s	Exhaust interface	KF40
	Vacuum gauge	Resistance gauge + ionization gauge
	Ultimate vacuum degree	1.3x10-4Pa	Power supply	AC;220V 50/60Hz
Sputter power supply	DC power supply	1 set	Output power	≤1000W
	Output voltage	≤600W	Response time	＜5ms
	RF power supply	1 set	Output power	≤1000W
	Power stability	≤5W
	RF frequency	13.56MHz	RF stability	±0.005%
Film thickness gauge	Resolution	±0.03Hz	Accuracy	±0.5%
Film thickness gauge	Upper range limit	50000	Speed	100~1000ms
Water cooled system	Tank volume	9L	Flow	10L/min
Gas system	Flowmeter type	MFC(mass flow meter)	Range	200sccm
Gas system	Gas type	Ar
Other	Input supply	AC220V,50Hz	Size	1400x750x1300mm
Other	Total power	4kw（host+vacuum pump）	Weight	295kg

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