Stainless steel chamber spin coater for wafers up to 12"

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Product Details

HS-SPC12-C spin coater is with vacuum chuck designed for easy and quick coating via sol-gel for wafers up to 12" diameter. This spin coater adopts advanced precision motor, the maximum speed can reach 5000rpm, which effectively guarantees the uniformity of film formation. Besides, the instrument adopts touch screen control, can preset the coating curve, which greatly simplifies the process.
Application:
The spin coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films. It is mainly used in photoresist spin coating, biological medium preparation, sol-gel method for polymer film production, etc.

Technical parameters:

Input power supply	AC220V, 50Hz
Chamber material	PP/Stainless steel (transparent acrylic upper cover)
Substrate size	Diameter≤12 inches (~300mm)
Spin speed	0-5000rpm
Acceleration	100-5000rpm/s
Speed resolution	1rpm
1rpm	3000s
Operation method	7 inches HD LCD touch screen
Dispensing method	Manual dispensing
Coating curve	Each curve has 5 segments, can store 5 curves in total
Vacuum chuck	Yes, include
Vacuum pump	Oil-less pump
Pumping speed	50 L/min
Total weight	~40kg

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