Dual heads plasma sputtering coater with rotary heating sample stage HS-PSP180G-2TA-RSH

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Product Details

This type of small plasma sputtering coating machine adopts two-stage sputtering method, which is widely used for SEM sample preparation or metal coating experiment. Using low-temperature plasma sputtering process, there is no high temperature during the coating process, and it is not easy to produce thermal damage. This small plasma sputtering coater uses PLC control system, all touch screen operation, easy to learn and use. This equipment is equipped with a rotatable heating sample stage, which can improve the uniformity of the coating and the adhesion of the film. This small plasma sputtering instrument uses a PLC control system, all touch screen operation, easy to learn and use. The equipment is small in size and beautiful in appearance, making it the best choice for laboratory coating experiments.

Technical parameters of plasma sputtering coater:

Sample stage	Size: 100mm Rotating speed: 1~20rpm adjustable Heating temperature: ≤500℃ Temperature control accuracy: ±1℃ PID temperature control
Plasma sputtering source	Quantity: 2 inchesx2 Cooling method: Water cooling
Vacuum chamber	Chamber size: φ180mm x 210mm Observation window: Omnidirectional visibility Chamber material:High purity quartz Open method: Top cover removable Upper and lower cover material:304 stainless steel Pumping port: KF16 Intake port: 1/4 inch ferrule connector
Power configuration	Quantity: DC power supplyx1 Output power: Max. 150W Sputtering power: 1200V Max.sputtering current: 50mA
Vacuum system	Vacuum pump type: Dual-stage rotary vane vacuum pump Pumping port: KF16 Exhaust interface: KF16 Pumping rate: 1.1L/s (4m3/h) Ultimate vacuum: ≥0.1Pa Vacuum measurement: Resistance vacuum gauge
Others	Power supply:AC 220V 50Hz Total power:2kW Dimension:500mm x 320mm x470mm Weight: 30kg

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