| Power supply: | AC220V |
| Working current: | Total working current not higher than1.2A (Not include the vacuum pump) |
| RF Power: | 200W |
| Radio frequency: | 13.56MKHZ(offset less than 0.2Hz) |
| Frequency offset | Less than 0.2KHz |
| Characteristic impedance: | 50 Ohm,Automatic matching |
| Vacuum degree: | 30Pa—100Pa |
| Gas flow: | 10—100ml/min(Adjustable) |
| Process Control: | MCU Automatic and manual mode |
| Cleaning time: | 1-6000 secds adjustable |
| Power supply: | 10%-100% Adjustable |
| Inside chamber size | 200mm×320mm |
| Outside dimension: | 600*600*780mm |
| Weight: | 45Kg |
| Vacuum chamber temperature | Less than 65°C |
| Cooling type: | Forced cooling |