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Double-head magnetron sputtering coater with bias power supply

Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. It can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.Compared with or
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Product Details

Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. It can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.

Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time.

In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory.


Technical Parameters of Double target magnetron sputtering coater:
 Item Detail
 Voltage AC220V,50Hz
 Power 3KW
 Ultimate vacuum 10-6 torr
 Sample stage

Size:dia.150mm

Heating temperature:MAX.500℃

Accuracy:±1℃

Speed:1~20rpm adjustable

 Magnetron sputtering head

Number: two ,2-inch

Cooling mode: Water cooling,10L / min flow rate

 Vacuum Chamber

Size:dia.300mm × 300mm H

Material:stainless steel

Observation window:dia.100mm

Opening mode:Open top, easy to replace the target

 Gas flow controller 2 channels: Ar, N2;Range 0-100sccm
 Vacuum pump Molecular pump system, pumping speed: 600L/S
 Film thickness gauge Quartz vibrating film thickness gauge, resolution: 0.10 μM
 Sputtering power supply

One DC power supply, 1000W, suitable for preparing metal film

One RF power supply, 500W, suitable for non-metallic coating

 Operation mode Panel button operation
 Dimensions 1400mm × 750mm × 1300mm
 Weight 300 KG
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