Power supply |
AC220V,50Hz |
Whole power |
6KW |
Ultimate vacuum |
5x10-4Pa |
Sample table parameters |
Size |
φ150mm |
Heat temp |
500℃ max. |
Temp control |
±1℃ |
Rotation speed |
1-20rpm adjustable |
Magnetron sputtering head parameters |
Quantity |
Size:2 inches x3 |
Cooling mode |
Water cooled, flow 10L/min required |
Water chiller |
10L/min Circulating water cooling |
Vacuum chamber |
Size |
φ300mm x 340mm H |
Material |
SUS |
Watch window |
φ100mm |
Opening mode |
open type, easy to replace target |
Gas flow controller |
One-channel,200sccm Ar; |
Vacuum pump |
A molecular pump system, pumping 600L/S |
Quartz vibrating film thickness gauge |
One set, resolution 0.10 angstrom |
Sputter power source |
DC power supply:500W, Suitable for preparing metal films |
Operating mode |
All-in-one computer operation |
Overall Dimensions |
1090mm x 900mm x 1250mm |
Total weight |
350kg |