High Power Desktop Magnetron Plasma Sputtering Coater with 3 Rotary Target

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Product Details

The instrument is a three-target magnetron coating machine with three two-inch magnetron target heads. The tilt angle of the target head and the distance from the sample stage are adjustable. In order to facilitate the experimental operation, the coating machine is also equipped with an electric baffle, which can directly control the opening and closing of the baffle through the display screen. The coating machine is equipped with a 100W RF power supply. By manually switching the output lines, three target heads can share one power supply (not simultaneous), thereby enabling operation of plating multiple or multiple layers of membranes in a single experiment.
The device is compact and well designed and can be placed on the desktop, making it ideal for lab purchases.
This set of configuration does not contain a vacuum system, customers can choose the high vacuum system that meets the requirements according to your own needs.

Specifications

Product name	Three-target RF magnetron sputtering coating machine
Product model	HS-VTC-3RF
Supply voltage	AC220V, 50Hz
RF power supply	0~100W continuously adjustable
Maximum power	200W
Chamber material	stainless steel
Chamber size	O.D.φ300mm x 300mm
Magnetron sputtering head	3x2”
Magnetron target parameter	Adjustable tilt angle 0~25° The distance from the target to the sample stage is 50~80mm Each target head is equipped with an electric baffle Cooling method is water-cooled, need to be equipped with 10L/min water chiller
Sample stage parameters	Size: φ185mm Speed: 1~10rpm adjustable Heating up to 500°C Temperature control accuracy: ±1°C