| Input Power |
1.220VAC 50/60Hz, single phase
2.2000W (including pump) |
| Source Power |
1.Two sputtering power sources are integrated into one control box |
| 2. DC source: 500W for coating metallic materials |
| 3.RF source: 600W with automatching for coating non-metallic materials ( Center) |
| 4.Compact 300 RF source is available at extra cost |
| Magnetron Sputtering Head |
1.Two 2" Magnetron Sputtering Heads with water cooling jackets are included
One is connected to RF power supply for no-conductive materials
Another is connected to DC sputtering power source for coating metallic materials |
| 2.Target size requirement: 2" diameter |
| 3.Thickness Range: 0.1 - 5 mm for both metallic and non-conductive targets |
| 4.One stainless steel and one Al2O3 ceramic targets are included for demo testing |
5.Head Water Cooling: 10ml/min water flow required, and one 16ml/min digitally
controlled recirculating water chiller is included for cooling both magnetron sputtering
heads |
6.Customized coater: Two DC head without, RF sputtering, RF head without
DC sputering,3 RF head are available upon request |
| Vacuum Chamber |
1.Vacuum Chamber: 300 mm Dia x 300 mm height, made of stainless steel |
| 2.Observation Window: 100 mm diameter |
| Sample Holder |
1.Sample holder size: 140mm dia. for. 4" wafer max |
| 2.Sample holder rotation speed is adjustable: 1 - 20 rpm for uniform coating |
| 3.The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C |
| Gas Flow Control |
1.Flow rate: 200 ml/min max. |
| 2.Flow rate is adjustable on the 6" touch screen control panel |
| Vacuum Pump Station |
High speed turbo vacuum pump system is directly installed on the vacuum chamber
for max. vacuum level |
Heavy duty dual stage mechanical pump is connected to turbo pump for faster
pump speed |
Mobile pump station is included and the compact sputtering coater can be put on
top of station |
| Max. vacuum level: 10^-6 torr with chamber baking |
| Thickness Monitor |
One Precision quartz thickness sensor is built into the chamber to monitor coating
thickness with accuracy 0.10 Å |
| LED Display Unit outside chamber can: |
| Input material to be coated according to data base included |
| Display total thickness coated and coating speed |
| 5 pcs quartz sensors (consumable) are included |
| Water cooling is required |
| Overall Dimensions |
L6600mm× W660mm× H1200mm |
| Application Note |
In order to remove oxygen from the chamber, suggest you use 5% Hytrogen + 95 %
Nitrogen to clan chamber 2-3 times, which can reduce oxygen to below 10 ppm |
| Please use > 5N purity Argon gas for plasma sputtering. Even though 5N purity Ar, usually contain 10- 100 ppm oxygen and H2O |
| Net Weight |
160 kg |
| Warranty |
One years limited warranty with lifetime support |
