Dual-target RF magnetron sputtering coater with two film thickness gauges HS-MSP300S-2RF-2FG

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Product Details

Dual-target RF magnetron sputtering coater is equipped with two 300W RF power sources. The RF power supply can be used for the preparation of non-metal films. The two targets can meet the needs of multi-layer coatings. If customers have other coating needs, RF power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.

The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.

In addition, this machine is equipped with two high precision film thickness gauges, which can meet the film thickness detection requirements during the coating process. If customers need to install multiple film thickness gauges, also can contact our technical staff for customization.

This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Dual-target RF magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Dual-target RF magnetron sputtering coater technical parameters:

Sample stage	Size	φ185mm
	Heating temperature	Max 500℃
	Temperature accuracy	±1℃
	Rotational speed	1-20rpm adjustable
Magnetron Sputtering head	Quantity	2”×2 (1”,2” optional)
	Cooling mode	Water cooling
	Water chiller	Circulating water chiller with flow rate of 10L/min
Vacuum chamber	Chamber size	φ300mm×300mm
	Chamber material	Stainless steel
	Watch window	φ100mm
	Opening mode	Top cover open
Mass flowmeter	2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs)
Vacuum system	Model	CY-GZK103-A
	Molecular pump	CY-600
	Backing pump	Rotary vane pump
	Ultimate vacuum	1.0E-5Pa
	Pumping interface	KF40
	Exhaust interface	KF16
	Vacuum measurement	Compound vacuum gauge
	Power supply	AC;220V 50/60Hz
	Pumping rate	Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes
Power configuration	Quantity	RF power supply×2
Power configuration	Max output power	RF 300W
Other parameters	Supply voltage	AC220V,50Hz
	Total power	2.5KW
	Overall size	600mm×650mm×1280mm
	Total Weight	About 300kg

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