Electron beam evaporation coating system

Electron beam evaporation coating system is used for preparing conductive film, semiconductor film, ferroelectric film, optical film, etc. It is widely used in colleges and universities, scientific research institutions and small batch production.Electron beam evaporation coating system specific

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Product Details

Structure		U-box front opening vacuum chamber, rear-mounted pumping system
Vacuum chamber		500×500×600mm2
Vacuum system configuration		Compound molecular pump, mechanical pump, gate valve
Ultimate pressure		≤6. 67×10-5Pa (after baking and degassing)
Vacuum recovery system		It can reach 6.67×10^-4pa in 45 minutes (after the system is exposed to the atmosphere for a short time and is filled with dry nitrogen)
Electron beam evaporation source	E type electron gun	Anode voltage: 6kv、8kv;
	Quantity (set)	1
	Crucible	Water-cooled crucible, four point design, each capacity of 11ml
	Power	0~6 KW adjustable
Resistance evaporation source (optional)	Voltage	5, 10V
	Power	Current 300A，the maximum output 3kw
	Quantity	One set, Switchable
	Water cooling electrode	Three roots, make up two evaporation boats
Type and size of workpiece frame		Substrate size: compatible with 4″substrate Max substrate heating temperature 800℃±1℃ Substrate rotates continuously, rotation speed:5-60 rpm The distance between the substrate and the evaporation source is adjustable from 300 to 350mm Manually controlled sample baffle assembly: 1 set
Gas circuit system		1-circuit 200SCCM mass flow controller
Quartz crystal oscillation film thickness controller		Thickness monitoring range: 0~99u9999A;
Floor Space	Main Set	900×800mm²
Floor Space	Electrical Cabinet	800×800mm² (two)

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